发明名称 METHOD AND APPARATUS FOR HIGH TEMPERATURE JET CLEANING
摘要 PURPOSE:To obtain a cleaning method having an excellent cleaning effect by performing cleaning by a jet of super-pure water having specific resistance of specified value or higher toward objects to be cleaned. CONSTITUTION:Cleaning is performed by jetting super-pure water having specific resistance of 17.0MOMEGA.cm or higher when in terms of temperature at 25 deg.C, toward objects to be cleaned. For example, the super-pure water supplied from a super- pure water supplying device 201 to a water tank 203 is supplied to a force pump 204 heated by a heater 205, and jetted in spray toward surfaces to be cleaned through nozzles 207. On that occasion, stainless steel (material SUS316L), etc., whose surface has been mirror-finished without producing any process deterioration layer by electro polishing technique and which has been oxidation- treated in a highly-pure oxidizing atmosphere having a very low impurity density are used for the liquid-touching parts such as the internal surface of the super- pure water supplying device 201, internal surface of the wafer tank 203, water- passing surfaces of the force pump 204 including its sliding part, internal surface of the heater 205, internal surfaces of the piping, and internal surfaces of the nozzles.
申请公布号 JPH03205824(A) 申请公布日期 1991.09.09
申请号 JP19900000873 申请日期 1990.01.07
申请人 OMI TADAHIRO 发明人 OMI TADAHIRO;KAWAKAMI MICHIYA;YAGI YASUYUKI;OWADA AKIRA;TAKAHARA YASUSHI
分类号 H01L21/304;B08B3/02;H01L21/00;H01L21/306 主分类号 H01L21/304
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