发明名称 Bonded compact and method of producing green bonded compact
摘要 Provided is a method of producing “a ceramic green bonded compact in which a ceramic green film is bonded on each bonding surface of a ceramic green substrate having hole portions,” the method imparting good adhesiveness to a thin green film while suppressing the green substrate from having deformation. In this method, first, a layer of a paste for bonding is formed on each bonding surface of green sheets prepared. Next, each bonding surface of the green sheets on which the paste layer is formed is brought into contact, in a state in which the paste layer is wet, with each bonding surface of a porous ceramic green substrate prepared. While this state is maintained, pores in the green substrate absorb a dispersion medium in the paste layer in the wet state. As a result, the paste layer is dried, thereby completely bonding the green substrate and the green sheets.
申请公布号 US9474193(B2) 申请公布日期 2016.10.18
申请号 US201314014956 申请日期 2013.08.30
申请人 NGK Insulators, Ltd. 发明人 Yoshioka Kunihiko;Ishibashi Satoshi
分类号 B32B18/00;B32B7/02;H05K1/03;H05K13/00;C04B35/634;C04B37/00;H01M8/02;H01M8/12 主分类号 B32B18/00
代理机构 Burr & Brown, PLLC 代理人 Burr & Brown, PLLC
主权项 1. A bonded compact which is a fired compact, comprising: a plate-like substrate having hole portions and being formed of an inorganic material, and a film, which is bonded on each bonding surface of the substrate, and has a thinner thickness than that of the substrate, the film being formed of an inorganic material having at least one of a different composition and a different microstructure from that of the substrate, wherein a ratio (T1/L1) of a thickness (T1) of a thinnest portion of the substrate to a maximum length (L1) in a cross-sectional shape of each of the hole portions in the substrate is 0.04 or more and 0.69 or less, wherein the film is formed of a dense inorganic material having a smaller porosity than that of the substrate, and wherein the part on which the film is formed in the bonding surface of the substrate has a flatness corresponding to 0.5 times or more and 20 times or less of the average value of the thicknesses of the film.
地址 Nagoya JP