发明名称 Circuit substrate having a circuit pattern and method for making the same
摘要 A circuit substrate includes: an insulative substrate formed with a pattern of a recess, the recess being defined by a recess-defining wall that has a bottom wall surface and a surrounding wall surface extending upwardly from the bottom wall surface; a patterned metallic layer structure including at least a patterned active metal layer disposed within the recess, formed on the bottom wall surface of the recess-defining wall, and spaced apart from the surrounding wall surface of the recess-defining wall, the patterned active metal layer containing an active metal capable of initiating electroless plating; and a primary metal layer plated on the patterned metallic layer structure.
申请公布号 US9474161(B2) 申请公布日期 2016.10.18
申请号 US201514933616 申请日期 2015.11.05
申请人 Taiwan Green Point Enterprises Co., Ltd. 发明人 Yi Sheng-Hung;Liao Pen-Yi
分类号 H01B13/00;H05K3/00;C23C18/16;C25D5/02;H05K3/18;B23K26/36;B23K26/40;C25D3/12;C25D3/38;C25D3/46;C25D3/48;C25D7/12;C25F5/00;H05K3/06;H05K3/46;C25D5/54;C23C18/20;H05K3/24;H05K3/02;H05K3/10 主分类号 H01B13/00
代理机构 Volpe and Koenig, P.C. 代理人 Volpe and Koenig, P.C.
主权项 1. A method for making a circuit substrate having a circuit pattern, the method comprising: (a) providing an insulative substrate having a top surface; (b) forming a pattern of a recess in the insulative substrate such that the recess is indented from the top surface, the recess being defined by a recess-defining wall having a bottom wall surface and a surrounding wall surface extending upwardly from the bottom wall surface; (c) forming a metallic layer structure on the recess-defining wall of the recess and the top surface of the insulative substrate, the metallic layer structure including at least one active metal layer containing an active metal capable of initiating electroless plating; (d) removing a portion of the metallic layer structure that is disposed along a peripheral edge of the bottom wall surface of the recess-defining wall so as to form the metallic layer structure into a first region which is disposed on the bottom wall surface, and a second region which is physically separated from the first region; and (e) plating a primary metal layer on the first region of the metallic layer structure.
地址 Taichung TW