发明名称 |
Control method for plasma discharge coating - uses unbalanced magnetron cathode and discharge voltage regulation by field coil current |
摘要 |
In a method of control of coating of substrates by condensation of particles from a plasma produced by gas discharge, an unbalanced magnetron cathode, pref. very unbalanced cathode, is used and the discharge voltage is regulated by means of the current flowing in a magnetic field coil, surrounding a permanent magnet arrangement. ADVANTAGE - Uniform coating without target poisoning.
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申请公布号 |
DE4017112(A1) |
申请公布日期 |
1991.12.05 |
申请号 |
DE19904017112 |
申请日期 |
1990.05.28 |
申请人 |
HAUZER HOLDING B.V., VENLO, NL |
发明人 |
DER ERFINDER WIRD NACHTRAEGLICH BENANNT |
分类号 |
C23C14/35;H01J37/34 |
主分类号 |
C23C14/35 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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