发明名称 Control method for plasma discharge coating - uses unbalanced magnetron cathode and discharge voltage regulation by field coil current
摘要 In a method of control of coating of substrates by condensation of particles from a plasma produced by gas discharge, an unbalanced magnetron cathode, pref. very unbalanced cathode, is used and the discharge voltage is regulated by means of the current flowing in a magnetic field coil, surrounding a permanent magnet arrangement. ADVANTAGE - Uniform coating without target poisoning.
申请公布号 DE4017112(A1) 申请公布日期 1991.12.05
申请号 DE19904017112 申请日期 1990.05.28
申请人 HAUZER HOLDING B.V., VENLO, NL 发明人 DER ERFINDER WIRD NACHTRAEGLICH BENANNT
分类号 C23C14/35;H01J37/34 主分类号 C23C14/35
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