| 摘要 |
PURPOSE:To prevent damage by forming a protective film in advance on the surface of a transparent substrate reverse to the side of the light-shielding film. CONSTITUTION:The light-shielding film 2 and the protective film 4 are formed on both sides of the transparent substrate 1 by using a sputtering device, and a resist film 3 is formed on the surface of the film 2 and baked by using a hot plate. The film 3 is exposed to light and subjected to development processing and hot plate baking to form a resist pattern. This pattern is descummed to improve the form of the resist pattern, and the light-shielding film 2 is patterned by using this resist pattern for a mask and wet etching the film 2, and at the same time the film 4 formed on the side of the substrate 1 is removed, thus permitting damage to be prevented by finally removing the resist film 3. |
