| 摘要 |
High purity gold films are photochemically deposited on substrates from the gold containing compound (CH3)2Au[CH(COCF3)2]. A vapor of the gold containing organometallic compound, possibly mixed with a carrier gas, is flowed over the surface of the substrate, which is at 0 DEG C. to 160 DEG C., and preferably at ambient temperature. Photodissociation is induced with ultraviolet light, inasmuch as the organometallic compound is strongly absorbing in the range of from about 300 to 340 nanometers. Substantially no organic fragments are deposited upon the surface, so that the deposited gold film is of high purity. |
