发明名称 Lateral gate electrode TFT switch and liquid crystal display device
摘要 A lateral gate electrode TFT switch and a liquid crystal display device are disclosed. The lateral TFT switch has a substrate, a source-drain area, a gate insulation layer and a gate electrode. The source-drain area is disposed on the substrate and has a source electrode, a drain electrode and a semiconductor layer. The semiconductor layer is disposed between the source electrode and the drain electrode. The source electrode and the drain electrode are vertically disposed on the substrate. The gate insulation layer is disposed adjacent to the source-drain area. The gate electrode is disposed adjacent to the gate insulation layer. The gate insulation layer is used to separate the source-drain area from the gate electrode.
申请公布号 US9508860(B2) 申请公布日期 2016.11.29
申请号 US201514417531 申请日期 2015.01.13
申请人 SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD. 发明人 Tang Yuejun
分类号 H01L23/62;H01L29/786;H01L29/423 主分类号 H01L23/62
代理机构 Hauptman Ham, LLP 代理人 Hauptman Ham, LLP
主权项 1. A lateral gate electrode TFT (Thin Film Transistor) switch, comprising: a substrate; a source-drain area which is disposed on the substrate and comprises a source electrode, a drain electrode and a semiconductor layer, the semiconductor layer being disposed between the source electrode and the drain electrode, the source electrode and the drain electrode being vertically disposed on the substrate; a gate insulation layer disposed adjacent to the source-drain area; a gate electrode disposed adjacent to the gate insulation layer, wherein the gate insulation layer is used to separate the source-drain area from the gate electrode, the semiconductor layer comprises a first ohm-contact layer, an active layer and a second ohm-contact layer, the active layer is disposed between the first ohm-contact layer and the second ohm-contact layer; and an insulation layer disposed between the source electrode and the semiconductor layer, a conductive channel is formed on a portion, without disposition of the insulation layer, between the source electrode and the semiconductor layer.
地址 Shenzhen, Guangdong CN