PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD, CURED FILM, INSULATION FILM, AND DISPLAY DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive composition providing a cured film having sufficient transmissivity and sensitivity to light exposure, a pattern forming method using the photosensitive composition, a cured film and an insulation film formed by using the photosensitive composition and a display device having the insulation film.SOLUTION: There is provided a photosensitive composition containing (A) a crosslinkable group-containing resin, (B) a photopolymerizable monomer and (C) a photoinitiator which is represented by the formula (1).SELECTED DRAWING: None