Positive photoresist containing dyes

摘要

A positive photoresist of the type containing an alkali-soluble novolac resin and a quinone diazide sensitizer contains a dye of the general formula: <IMAGE> wherein R' is lower alkyl, R'' is H, alkyl or CO2-alkyl, alkyl-CO2-alkyl or alkyl-CO2-(C1-C3 alkyl-O)n-alkyl (n=1-3) and wherein said dye is compatible with the novolac resin/quinone diazide formulation to at least 0.1 phr. The dye reduces reflective notching. Preferably the photoresist also contain a nitro naphthol dye to reduce the effects of I-Line radiation.