发明名称 Photosensitive composition
摘要 Disclosed is a polymer having a group represented by the following formula (I) or (II) in a side chain on a main chain consisting of carbon-carbon bonds: <IMAGE> (I) <IMAGE> (II) [wherein X is an oxygen atom, a sulfur atom or N-R1, R1 is a hydrogen atom, an alkyl group containing 1 to 3 carbon atoms or CH2CO2H], said group being decarboxylated by photo-reaction of its own or by photo-reaction with a photo-sensitizer which absorbs light to generate a free radical.
申请公布号 US5227279(A) 申请公布日期 1993.07.13
申请号 US19920856861 申请日期 1992.03.24
申请人 NIPPON PAINT CO., LTD. 发明人 KAWABATA, MASAMI
分类号 G03F7/038 主分类号 G03F7/038
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