发明名称 |
DEEP UV SENSITIVE PHOTORESIST RESISTANT TO LATENT IMAGE DECAY |
摘要 |
2181-35-24 PATENT DEEP UV SENSITIVE PHOTORESIST RESISTANT TO LATENT IMAGE DECAY A positive working deep UV sensitive photoresist which provides improved critical dimension stability during prolonged periods of post exposure delay before baking comprises an acid stable polymer which is insoluble in water but normally soluble in an aqueous alkaline medium, a photoinitiator which generates acid upon exposure to actinic radiation, and a mixed carbonate ester of tertiary butyl alcohol and a polyhydric phenol which is an acid labile compound which inhibits the dissolution of the normally soluble polymer in said alkaline medium. PA218100.RMD
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申请公布号 |
CA2089722(A1) |
申请公布日期 |
1993.08.26 |
申请号 |
CA19932089722 |
申请日期 |
1993.02.17 |
申请人 |
MORTON INTERNATIONAL, INC. |
发明人 |
LAZARUS, RICHARD M.;GRUNWALD, JOHN J.;HAALONIM, CHAVA G.;HIRSH, SHULAMIT |
分类号 |
G03F7/004;G03F7/039;H01L21/027;(IPC1-7):G03F7/039;G03F7/40;H01L21/461;H01L21/47;H01L21/70 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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