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发明名称
SILICON WAFER SURFACE TREATMENT METHOD BY HOT PURE WATER CLEANING
摘要
申请公布号
JPH07153728(A)
申请公布日期
1995.06.16
申请号
JP19930299321
申请日期
1993.11.30
申请人
SUMITOMO SITIX CORP
发明人
MORIKAWA HIROSHI
分类号
H01L21/304;(IPC1-7):H01L21/304
主分类号
H01L21/304
代理机构
代理人
主权项
地址
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