发明名称 Method for forming film by plasma CVD
摘要 A magnetic recording medium comprising a back coating layer formed on a surface reverse to a magnetic layer and a carbonaceous film which is formed on the back coating layer and contains fluorine atoms and silicon atoms and/or nitrogen atoms and in which a concentration of fluorine atoms decreases in a depth direction from a surface of the carbonaceous film, while a concentration of the silicon and/or nitrogen atoms increases in the depth direction from the surface of the carbonaceous film, which recording medium has improved running stability, durability and weatherability while electromagnetic conversion characteristics are maintained.
申请公布号 US5496595(A) 申请公布日期 1996.03.05
申请号 US19940325067 申请日期 1994.10.19
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 UEDA, HIDEYUKI;KUWAHARA, KENJI;SEKI, HIROSHI;TAKAHASI, KIYOSI;ODAGIRI, MASARU;MURAI, MIKIO
分类号 C23C16/50;C23C16/27;G11B5/64;G11B5/66;G11B5/72;G11B5/725;G11B5/73;G11B5/735;G11B5/84;H01L21/205;(IPC1-7):H05H1/24;G11B5/00 主分类号 C23C16/50
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