发明名称 |
Method for forming film by plasma CVD |
摘要 |
A magnetic recording medium comprising a back coating layer formed on a surface reverse to a magnetic layer and a carbonaceous film which is formed on the back coating layer and contains fluorine atoms and silicon atoms and/or nitrogen atoms and in which a concentration of fluorine atoms decreases in a depth direction from a surface of the carbonaceous film, while a concentration of the silicon and/or nitrogen atoms increases in the depth direction from the surface of the carbonaceous film, which recording medium has improved running stability, durability and weatherability while electromagnetic conversion characteristics are maintained.
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申请公布号 |
US5496595(A) |
申请公布日期 |
1996.03.05 |
申请号 |
US19940325067 |
申请日期 |
1994.10.19 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
UEDA, HIDEYUKI;KUWAHARA, KENJI;SEKI, HIROSHI;TAKAHASI, KIYOSI;ODAGIRI, MASARU;MURAI, MIKIO |
分类号 |
C23C16/50;C23C16/27;G11B5/64;G11B5/66;G11B5/72;G11B5/725;G11B5/73;G11B5/735;G11B5/84;H01L21/205;(IPC1-7):H05H1/24;G11B5/00 |
主分类号 |
C23C16/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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