发明名称 Magnetostrictive film, magnetostrictive element, torque sensor, force sensor, pressure sensor, and manufacturing method therefor
摘要 For providing a magnetostrictive film that can exhibit high magnetostrictive properties in the vicinity of zero magnetic field and their manufacturing methods, a magnetostrictive film thermal sprayed on an object under test includes a metallic glass film subjected to thermal processing at a temperature lower than the glass transition temperature and not lower than the Curie point, and shows a linearity between the magnetic field and the magnetostriction in at least a part of the magnetic field from −15 kA/m to +15 kA/m (both inclusive).
申请公布号 US9506824(B2) 申请公布日期 2016.11.29
申请号 US201013388528 申请日期 2010.07.30
申请人 JAPAN SCIENCE AND TECHNOLOGY AGENCY 发明人 Motoe Yoshitsugu;Nakashima Koji;Ishikawa Tomohito;Sugiyama Masaharu;Igarashi Takanori;Wakiwaka Hiroyuki;Makino Akihiro;Inoue Akihisa
分类号 B32B15/00;G01L3/10;C22C33/00;C22C45/02;C23C4/06;G01R33/18;H01F10/13;H01L41/12;H01L41/47;H01L41/20 主分类号 B32B15/00
代理机构 Rankin, Hill & Clark LLP 代理人 Rankin, Hill & Clark LLP
主权项 1. A magnetostrictive film thermal sprayed on an object under test, including a metallic glass film applied as a supercooled liquid having a supercooled liquid temperature range ΔTx equal to or more than 30° C., subjected to thermal processing at a temperature lower than the glass transition temperature and not lower than the Curie point, and showing a linear relationship between the magnetic field and the magnetostriction in at least a part of the magnetic field ranging from −15 kA/m to zero and in at least a part of the magnetic field ranging from zero to +15 kA/m, and having a variation due to magnetostriction of a test specimen measured at the following conditions: using a test specimen comprising a 3 mm×25 mm, 0.3 mm-thick rectangular substrate and a 200 μm-thick magnetostrictive film formed on the substrate by thermal spraying; and applying a magnetic field of from −80 kA/m up to +80 kA/m to the test specimen, wherein the variation due to magnetostriction is at least 15 μm or greater and at most 30 μm or smaller in the magnetic field ranging from −15 kA/m to +15 kA/m.
地址 Kawaguchi-Shi, Saitama JP