Copper@ electrodeposition from etching liquid

摘要

Copper deposition from an etching liquid involves passing the liquid through a buffer vessel before entry into a multi-cell electrolysis tank to provide uniform distribution to the individual cells of the tank. A sensor (34), for adjusting the etching liquid, is located in a by-pass (36) to an etching liquid circulation line (37) between an etching vessel (32) and the electrolysis cell (33) and is connected to the circulation line (37) in adjustable time intervals by a valve (38), a switching phase of the sensor (34) occurring when the valve (38) is closed, i.e. the etching liquid is stationary. Also claimed is an apparatus for carrying out the above process.