发明名称 Fresnel zone plate
摘要 A Fresnel zone plate is provided for encountering incident light having a wavelength. The Fresnel zone plate has a focal length and a wafer including alternating transparent and opaque zones, and a mourning surface. A plurality of silicon nanowires extend into opaque zone of the wafer. A mechanically stretchable tuning structure is mounted to the mounting surface such that stretching of the tuning structure varies the focal length of the Fresnel zone plate.
申请公布号 US9529126(B2) 申请公布日期 2016.12.27
申请号 US201414151087 申请日期 2014.01.09
申请人 Wisconsin Alumni Research Foundation 发明人 Jiang Hongrui;Lu Yen-Sheng;Liu Hewei
分类号 G02B5/18;G02B27/42 主分类号 G02B5/18
代理机构 Boyle Fredrickson, S.C. 代理人 Boyle Fredrickson, S.C.
主权项 1. A Fresnel zone plate for encountering incident light having a wavelength, comprising: a substrate defining a generally planar surface; a first set of rings radially spaced about a central axis along the surface of the substrate, the first set of rings being transparent; a second set of rings radially spaced about the central axis along the surface of the substrate, each ring of the second set of rings including a surface lying in a plane perpendicular to the central axis and being opaque; and a plurality of silicon nanowires extending into at least one of the surfaces of the second set of rings, the plurality of silicon nanowires; having lengths in the range of 1 micrometer to 6 micrometers; andbeing randomly distributed in the at least one of the surfaces of the second set of rings;wherein each of the plurality of silicon nanowires extending along a corresponding axis generally perpendicular to the plane and being spaced from an adjacent silicon nanowire by a distance less than the wavelength of the incident light.
地址 Madison WI US