发明名称 |
Fresnel zone plate |
摘要 |
A Fresnel zone plate is provided for encountering incident light having a wavelength. The Fresnel zone plate has a focal length and a wafer including alternating transparent and opaque zones, and a mourning surface. A plurality of silicon nanowires extend into opaque zone of the wafer. A mechanically stretchable tuning structure is mounted to the mounting surface such that stretching of the tuning structure varies the focal length of the Fresnel zone plate. |
申请公布号 |
US9529126(B2) |
申请公布日期 |
2016.12.27 |
申请号 |
US201414151087 |
申请日期 |
2014.01.09 |
申请人 |
Wisconsin Alumni Research Foundation |
发明人 |
Jiang Hongrui;Lu Yen-Sheng;Liu Hewei |
分类号 |
G02B5/18;G02B27/42 |
主分类号 |
G02B5/18 |
代理机构 |
Boyle Fredrickson, S.C. |
代理人 |
Boyle Fredrickson, S.C. |
主权项 |
1. A Fresnel zone plate for encountering incident light having a wavelength, comprising:
a substrate defining a generally planar surface; a first set of rings radially spaced about a central axis along the surface of the substrate, the first set of rings being transparent; a second set of rings radially spaced about the central axis along the surface of the substrate, each ring of the second set of rings including a surface lying in a plane perpendicular to the central axis and being opaque; and a plurality of silicon nanowires extending into at least one of the surfaces of the second set of rings, the plurality of silicon nanowires;
having lengths in the range of 1 micrometer to 6 micrometers; andbeing randomly distributed in the at least one of the surfaces of the second set of rings;wherein each of the plurality of silicon nanowires extending along a corresponding axis generally perpendicular to the plane and being spaced from an adjacent silicon nanowire by a distance less than the wavelength of the incident light. |
地址 |
Madison WI US |