发明名称 Electrophotographic method using amorphous silicon photosensitive material
摘要 More than 100,000 pieces of copy are obtained, in an electrophotographic process using an amorphous silicon photosensitive material, by maintaining the atmosphere for the photosensitive material and effecting the developing and polishing of the surface of the photosensitive material in a manner such that X, the degree of surface oxidation of the amorphous silicon photosensitive material (SiO/SiC), and Y, the amount of deposition of discharge products (mol/cm2), satisfy the relationships (1) and (2); 0.4</=x</=1.25 (1) Y</=2.2x10-9.exp(-2.0 x) (2)By this method, image flow is prevented without permitting the life of the photosensitive material to decrease, and an image can be stably formed for extended periods of time.
申请公布号 US5547805(A) 申请公布日期 1996.08.20
申请号 US19950427174 申请日期 1995.04.24
申请人 MITA INDUSTRIAL CO., LTD. 发明人 HAZAMA, HIROYUKI;TSUTSUMI, MASAHIRO;WATANABE, MASARU
分类号 G03G5/00;G03G5/082;(IPC1-7):G03G13/22 主分类号 G03G5/00
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