METHOD OF FORMING DEPOSITION FILM BY HIGH-FREQUENCY PLASMA CVD METHOD,申请号JP19940270192-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	METHOD OF FORMING DEPOSITION FILM BY HIGH-FREQUENCY PLASMA CVD METHOD
摘要
申请公布号	JPH08222519(A)	申请公布日期	1996.08.30
申请号	JP19940270192	申请日期	1994.10.11
申请人	CANON INC	发明人	TAKAI YASUYOSHI
分类号	G03G5/08;C23C16/50;H01L21/205;(IPC1-7):H01L21/205	主分类号	G03G5/08
代理机构		代理人
主权项
地址

您可能感兴趣的专利

Perfectionnements apportés aux engrenages de direction des véhicules automobiles

Perfectionnements aux sacs ou emballages munis de rubans d'ouverture

Arrangement in dismountable office swivel chairs

Sliding automobile seat attachment

Air cushion suspension for automobile vehicles

Tool-carrying chains

Automatic cable-clamping mechanism for cable-tool drill

Means for removing underground street railways and their appurtenant structures

Centrifugal drier construction

Liquid mixing and proportioning device

Hair curling and waving device

Upright furnace assembly

Poppet valve with wear resistant stem tip

Tappet construction

Railway vehicle truck

Gripper construction for duplicators

Photocomposing apparatus

Transfer developing apparatus

Arbor-supporting jack for machine tools

Recoiling barrel operated pivoted loading tray mechanism