| 摘要 |
PROBLEM TO BE SOLVED: To provide a chemical mechanical polishing pad that mitigates issues of a window bulge and uneven window wear.SOLUTION: A chemical mechanical polishing pad 10 has a polishing layer 20, an endpoint detection window 30, a subpad 25, and a stack adhesive 23. The subpad includes a plurality of apertures 42, 45, 47 in optical communication with the endpoint detection window. A polishing surface 14 of the polishing layer is adapted for polishing a substrate.SELECTED DRAWING: Figure 6 |
