| 摘要 |
<p>In a scanning electron microscope, a pair of fiducial patterns (10, 11) are so laid out on an X-Y stage so that they are separated with a distance equivalent to the distance between the optical axis of an optical microscope (5) and that of an electron optical system (3). The image signals of these patterns (10, 11) are captured by an image processing circuit (12). A position shift of the optical axis of the optical microscope (5) and a position shift of the optical axis of the electron optical system (3) with respect to the fiducial patterns (10, 11) are obtained by numerical calculation, and this position shift is used as an offset value in the actual measurement by the scanning electron microscope, which leads to an accurate positioning. <IMAGE></p> |
