| 摘要 |
PROBLEM TO BE SOLVED: To provide a production method of a composition for forming a coating film for lithography, with which metal impurities causing etching defects are significantly reduced.SOLUTION: Provided is a production method of a composition for forming a coating film for lithography, which is used in a semiconductor device manufacturing step, by using a production apparatus including a metal adsorbent and a filter, and includes: (1) a step to introduce a solvent used in the composition for forming the coating film for lithography into the production apparatus; (2) a step to adsorb metal impurities with the metal adsorbent by circulating the solvent in the production apparatus; (3) a step to prepare the composition for forming the coating film for lithography by adding a raw material of the composition for forming the coating film for lithography to the circulated solvent and making the raw material with the solvent uniform; and (4) a step to remove fine foreign matters with the filter by circulating the prepared composition for forming the coating film for lithography in the production apparatus.SELECTED DRAWING: Figure 1 |
