发明名称 |
THIN FILM TRANSISTOR AND ITS MANUFACTURING METHOD, ARRAY SUBSTRATE, AND DISPLAY DEVICE |
摘要 |
A thin film transistor and its manufacturing method, an array substrate and a display device are disclosed, the thin film transistor is of a gate bottom contact type, and includes a gate electrode (3) and a gate insulation layer (2), the gate insulation layer (2) is provided with a recess (4) at a position corresponding to the gate electrode (3). With the thin film transistor, the problem of wire breakage in the active layer at the channel between the source/drain electrodes can be avoided, the performance and stability of the thin film transistor is improved, and the production cost is lowered down. |
申请公布号 |
US2016276606(A1) |
申请公布日期 |
2016.09.22 |
申请号 |
US201414769670 |
申请日期 |
2014.11.07 |
申请人 |
BOE TECHNOLOGY GROUP CO., LTD. |
发明人 |
FONG Honhang;XIE Yingtao;OUYANG Shihong;CAI Shucheng;SHI Qiang;LIU Ze |
分类号 |
H01L51/05;H01L29/786;H01L29/66;H01L51/10;H01L27/28 |
主分类号 |
H01L51/05 |
代理机构 |
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代理人 |
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主权项 |
1. A thin film transistor, of a gate bottom contact type, comprising a gate electrode and a gate insulation layer,
wherein the gate insulation layer is provided with a recess at a position corresponding to the gate electrode. |
地址 |
Beijing CN |