| 发明名称 |
Process for use of photoresist composition with deep ultraviolet radiation |
| 摘要 |
The present invention relates to a process for generating a resist image on a substrate utilizing a resist composition comprising (a) a radiation-sensitive acid generator, (b) a substituted androstane, and (c) a copolymer acrylate binder. The resist image is made using deep ultraviolet radiation.
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| 申请公布号 |
US5786131(A) |
申请公布日期 |
1998.07.28 |
| 申请号 |
US19960678868 |
申请日期 |
1996.07.12 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
ALLEN, ROBERT DAVID;DIPIETRO, RICHARD ANTHONY;WALLRAFF, GREGORY MICHAEL |
| 分类号 |
G03F7/039;G03F7/004;H01L21/027;(IPC1-7):G03C5/00;G03C1/492 |
主分类号 |
G03F7/039 |
| 代理机构 |
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| 主权项 |
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