发明名称 NOVEL COPPER(I) PRECURSORS FOR CHEMICAL DEPOSIT IN GAS PHASE OF METALLIC COPPER
摘要 <p>The invention concerns complex compounds of oxidised copper (+1) stabilised by a ligand for the gas phase chemical deposit of copper in which the copper is co-ordinated with a β-diketonate and the ligand is an alkyne of which the triple bond is partially deactivated by one or two groups slightly attracting the electrons carried by said alkyne.</p>
申请公布号 WO1998040387(A1) 申请公布日期 1998.09.17
申请号 FR1998000518 申请日期 1998.03.13
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