发明名称 |
ELASTIC WAVE DEVICE |
摘要 |
An elastic wave device includes an IDT electrode provided on a main surface of a LiTaO3 substrate, and uses plate waves in an SH0 mode, which is a basic mode of SH waves. A wavelength-normalized thickness of the LiTaO3 substrate normalized by a wavelength determined by a pitch of electrode fingers of the IDT electrode, and an Al equivalent wavelength-normalized thickness of the IDT electrode satisfy any one of combinations listed in the following table:;(a)The wavelength-normalized thickness is about 0.01 ormore and about 0.30 or less, and the wavelength-normalized thickness of Al is about 0.04 or more andabout 0.1 or less.(b)The wavelength-normalized thickness is about 0.01 ormore and about 0.70 or less, and the wavelength-normalized thickness of Al is about 0.04 or more andabout 0.08 or less. |
申请公布号 |
US2016352305(A1) |
申请公布日期 |
2016.12.01 |
申请号 |
US201615236594 |
申请日期 |
2016.08.15 |
申请人 |
Murata Manufacturing Co., Ltd. |
发明人 |
KIMURA Tetsuya |
分类号 |
H03H9/145;H03H9/02 |
主分类号 |
H03H9/145 |
代理机构 |
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代理人 |
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主权项 |
1. An elastic wave device comprising:
a LiTaO3 substrate; and an IDT electrode provided on a main surface of the LiTaO3 substrate and made of Al or predominantly made of Al; wherein the elastic wave device uses a plate wave in an SH0 mode that is a basic mode of SH waves; and a wavelength-normalized thickness of the LiTaO3 substrate that is a thickness of the LiTaO3 substrate normalized by a wavelength determined by a pitch of electrode fingers of the IDT electrode and an Al equivalent wavelength-normalized thickness of the IDT electrode satisfy any one of combinations listed in Table 1:TABLE 1(a)The wavelength-normalized thickness is about 0.01 ormore and about 0.30 or less, and the wavelength-normalized thickness of Al is about 0.04 or more andabout 0.1 or less.(b)The wavelength-normalized thickness is about 0.01 ormore and about 0.70 or less, and the wavelength-normalized thickness of Al is about 0.04 or more andabout 0.08 or less. |
地址 |
Nagaokakyo-shi JP |