发明名称 FORMATION OF DEPOSITED FILM AND DEPOSITED FILM FORMING DEVICE
摘要 PROBLEM TO BE SOLVED: To remarkably improve the film quality of a deposited film to be formed on a substrate by using a bar-shaped electrode arranged parallel to the axial direction of a cylindrical substrate as a high frequency electric power introducing means generating a glow discharge in a reaction vessel and feeding a gaseous raw material toward the direction of the bar-shaped electrode. SOLUTION: A gaseous raw material introducing tube 106 is provided approximately parallel to the axial direction of a cylindrical substrate 105 held to a substrate holder 111 in a reaction vessel 101, a bar-shaped electrode 102 is closely provided on the circle concentric with that of the gaseous raw material introducing tube 106 at a distance of 40 to 100 mm, and this bar-shaped electrode 102 is used as a high frequency electric power introducing means. By this constitution, the temp. of the cylindrical substrate 105 is controlled to be at a prescribed one, the gaseous raw material is introduced from the gaseous raw material introducing tube 106, and the flow rate is controlled to the set one. When the pressure in the reaction vessel 101 is made stable, a high frequency electric power of 50 to 450 MHz frequency is fed from a high frequency power source 104 via a matching box 103 to the bar-shaped electrode 102, and a glow discharge is generated in the reaction vessel to excite and dissociate the gaseous raw material, thereby, a deposited film is formed on the cylindrical substrate 105.
申请公布号 JP2000054146(A) 申请公布日期 2000.02.22
申请号 JP19980223028 申请日期 1998.08.06
申请人 CANON INC 发明人 HOSOI KAZUTO;AKIYAMA KAZUYOSHI;SHIRASAGO TOSHIYASU;MURAYAMA HITOSHI;TAZAWA DAISUKE;OTSUKA TAKASHI
分类号 G03G5/082;C23C14/24;C23C16/50;(IPC1-7):C23C16/50 主分类号 G03G5/082
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