发明名称 MICROLENS FORMATION METHOD OF SOLID-STATE COLOR IMAGING DEVICE
摘要 PURPOSE: A micro-lens formation method of solid-state color imaging device is provided to form micro-lens with high curvature and reduce a focal length and a thickness of interlayer and increase efficiency of light collection and maintain an interval of micro-lens constantly. CONSTITUTION: The micro-lens formation method of solid-state color imaging device comprises the steps of forming a photo diode in a semiconductor board; forming a photo shield film, a first flat layer, and a second flat layer sequentially; forming a pattern of micro-lens on the second flat layer; filling flowing material to a gap of micro-lens pattern; and thermal flow the micro-lens pattern. The first and second flat layer is an insulating film. The micro-lens pattern is a convex lens pattern and flowing material is filled by the spin coating method.
申请公布号 KR20000014260(A) 申请公布日期 2000.03.06
申请号 KR19980033583 申请日期 1998.08.19
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, SEONG GYUN
分类号 H01L27/146;(IPC1-7):H01L27/146 主分类号 H01L27/146
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