发明名称 |
MICROLENS FORMATION METHOD OF SOLID-STATE COLOR IMAGING DEVICE |
摘要 |
PURPOSE: A micro-lens formation method of solid-state color imaging device is provided to form micro-lens with high curvature and reduce a focal length and a thickness of interlayer and increase efficiency of light collection and maintain an interval of micro-lens constantly. CONSTITUTION: The micro-lens formation method of solid-state color imaging device comprises the steps of forming a photo diode in a semiconductor board; forming a photo shield film, a first flat layer, and a second flat layer sequentially; forming a pattern of micro-lens on the second flat layer; filling flowing material to a gap of micro-lens pattern; and thermal flow the micro-lens pattern. The first and second flat layer is an insulating film. The micro-lens pattern is a convex lens pattern and flowing material is filled by the spin coating method.
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申请公布号 |
KR20000014260(A) |
申请公布日期 |
2000.03.06 |
申请号 |
KR19980033583 |
申请日期 |
1998.08.19 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM, SEONG GYUN |
分类号 |
H01L27/146;(IPC1-7):H01L27/146 |
主分类号 |
H01L27/146 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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