METHOD AND DEVICE FOR VAPOR PHASE DEPOSITION

摘要

PROBLEM TO BE SOLVED: To perform an epitaxial vapor phase deposition by maintaining partial pressures of water vapor and oxygen in a reaction tube and a load lock chamber. SOLUTION: In a longitudinal vapor phase deposition device 20 having a carrying means 71 in a reaction tube 22, the carrying means 71 is composed of a vertically moving mechanism 50 and a cover material 70 which is expandable in vertical direction and covers the vertically moving mechanism 50. The cover material 70 airtightly isolates the vertically moving mechanism 50 from outside air, and purge gas is fed to the inside space of the cover material 70.