发明名称 MANUFACTURE OF SEMICONDUCTOR INTEGRATED CIRCUIT
摘要 PROBLEM TO BE SOLVED: To adjust an on-voltage of a diode to a desired value by manufacturing a diode comprising two or more kinds of different on-voltages using a selection re-growth process. SOLUTION: A collector contact layer 2 and collector layer 3 are sequentially formed on a semiconductor substrate 1, an insulating film 9 is formed on the collector layer 3 before providing an insulating film opening in a re-growth region at a diode element part in a photo-resist process, and a P-type semiconductor layer 11 is selectively re-grown at the insulating film opening part, forming PN junction with the collector layer 3. An electrode metal 132 is vapor- deposited on the semiconductor layer 11 while, related to a diode part, an N+ type subcollector layer 2 is exposed to form an electrode metal 131 providing an ohmic contact to the collector electrode 6 and N+ type semiconductor, forming a PN junction diode which decides an on-voltage.
申请公布号 JP2000216256(A) 申请公布日期 2000.08.04
申请号 JP19990124862 申请日期 1999.04.30
申请人 NEC CORP 发明人 NAGANO NOBUO
分类号 H01L21/822;H01L21/329;H01L21/8222;H01L27/04;H01L27/06;H01L27/095;H01L29/47;H01L29/861;H01L29/872;(IPC1-7):H01L21/822 主分类号 H01L21/822
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