Method for producing a solar cell

摘要

The invention relates to a method for producing a solar cell having a substrate made of silicon, which substrate has a silicon oxide layer present on the surface of the substrate and an antireflection layer applied to the silicon oxide layer, which antireflection layer is deposited onto the dielectric passivation layer in a process chamber. According to the invention, in order to achieve a stability of corresponding solar cells or solar cell modules produced therefrom against a potential induced degradation (PID), the dielectric passivation layer is formed from the surface of the substrate in the process chamber by means of a plasma containing an oxidizing gas.

主权项

1. A method for producing a solar cell, the method comprising:
providing a silicon substrate; forming a hydrophilic surface on the substrate by wet chemical oxidation; providing a preliminary processing chamber; providing a processing space downstream of said preliminary processing chamber; forming a dielectric passivation layer from the hydrophilic surface of the substrate in the preliminary processing chamber, by exposing the substrate to a temperature T≧250° C., for a time t, in the presence of an oxidizing gas with an oxygen partial pressure of at least 100 Pa; and depositing an antireflection layer on the dielectric passivation layer in the processing space.