发明名称 Anlage zur Bearbeitung von Wafern
摘要 The invention relates to a system for treating wafers in at least one clean room (3). The inventive system comprises an arrangement of production units (1) and measuring units (2) which are connected to wafers via a transport system for transporting cassettes. Several functionally allocated production units (1) and/or measuring units (2) are combined to form a manufacturing cell (4) which is provided with a loading and unloading station (7) for receiving and forwarding cassettes with wafers. Individual wafers can be supplied to the production units (1) and/or measuring units (2) within the manufacturing cell (4) in order to be treated.
申请公布号 DE19921245(A1) 申请公布日期 2000.11.16
申请号 DE19991021245 申请日期 1999.05.07
申请人 SIEMENS AG 发明人
分类号 B65G49/07;H01L21/00;H01L21/677;(IPC1-7):B65G49/07 主分类号 B65G49/07
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