发明名称 SELF-CLEANING ION DOPING DEVICE AND METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To clean an anode electrode without opening a device to the atmosphere by providing a first switching device capable of switching the positive electrode of an arc power source to a chamber internal wall, a second switching device capable of connecting and cutting off the positive electrode of a sputter power source for sputtering the anode electrode, to and from the positive electrode of the arc power source, and a third switching device capable of switching a negative electrode to the anode electrode. SOLUTION: The positive electrode of an arc power source 22 is switched to an ion source internal wall 1a by a first switching device 34, and the positive electrode of a sputter power source is connected to the positive electrode of the arc power source by a second switching device 36, the negative electrode of the sputter power source is switched to an anode electrode by a third switching device 38 to generate plasma between the ion source internal wall 1a and filaments 8. Using this plasma, sputtering is applied to the anode electrode impressed to negative, to eliminate a deposite on the anode electrode to obtain an excellent ion source characteristic. In the sputter power source 32, it is preferable that bias voltage to the positive electrode of the arc power source 22 is 0--1000 V.
申请公布号 JP2000340165(A) 申请公布日期 2000.12.08
申请号 JP19990148141 申请日期 1999.05.27
申请人 ISHIKAWAJIMA HARIMA HEAVY IND CO LTD 发明人 KAWASAKI YOSHINORI;NAKAMOTO ICHIRO;KUWABARA HAJIME
分类号 H01J27/02;C23C14/48;H01J37/08;H01J37/317;H01L21/265;(IPC1-7):H01J37/317 主分类号 H01J27/02
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