| 摘要 |
PROBLEM TO BE SOLVED: To provide a technology for accurately inspecting pattern defect by eliminating a difference in level between sensor data and reference data, and eliminating recognition errors in detecting defects. SOLUTION: A comparison circuit 4 compares reference data with sensor data by means of a level comparison circuit 9 by cutting an area from either the reference data or sensor data by means of an area cutting circuit 5, and converting using a level converting circuit the level of the data from which the area has been cut, in accordance with the result of accumulation of light quantities within the area.
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