发明名称 STAGE DEVICE AND EXPOSURE SYSTEM
摘要 PROBLEM TO BE SOLVED: To reduce vibration caused by of the center of gravity or the transformation of the device accompanying the shifting of a stage. SOLUTION: The shifting and reaction of the center of gravity of a stage device 40, which are caused by shifting of at least one of the first stage WST1 and the second stage WST2, are offset by shifting members DMX1, DMX2, DMY1, and DMY2 shifting. Then, the shifting and reaction of the center of gravity of the stage device 40 which could not be offset out entirely by the shifting of the shifting members DMX1, DMX2, DMY1, and DMY2 is offset completely by a base 42 shifting. That is, even if at least one of the first stage WST1 and the second stage WST2 shifts, the center of gravity of the stage device 40 does not shift, and the reaction is canceled without fail.
申请公布号 JP2001118773(A) 申请公布日期 2001.04.27
申请号 JP19990294890 申请日期 1999.10.18
申请人 NIKON CORP 发明人 RI SEIBUN
分类号 H01L21/027;G03B27/58;G03F7/20;H02K41/03;(IPC1-7):H01L21/027 主分类号 H01L21/027
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