发明名称 |
METHOD FOR PRODUCING SILICON CARBIDE SINGLE CRYSTAL |
摘要 |
PROBLEM TO BE SOLVED: To seal micropipe defects present in a silicon carbide single crystal in the inside of the silicon carbide single crystal. SOLUTION: A silicon carbide crystal substrate 1 having micropipe defects 6 is prepared. Coating materials 5 are arranged so as to be brought into contact with both the sides of the silicon carbide crystal substrate 1. Then the silicon carbide crystal substrate 1 on which the coating materials 5 are arranged is heat-treated under pressure and the silicon carbide crystal substrate 1 is integrated with the coating materials 5. Then the silicon carbide crystal substrate 1 integrated with the coating materials 5 is heat-treated to seal the micropipe defects 6 present in the silicon carbide crystal substrate 1 in the inside of the silicon carbide crystal substrate 1. Since the micropipe defects formed in the silicon carbide crystal substrate 1 can be packed with the coating materials 5 without gaps by the heat treatment under pressure, the micropipe defects 6 can be effectively sealed by a micropipe defect sealing process.
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申请公布号 |
JP2001158696(A) |
申请公布日期 |
2001.06.12 |
申请号 |
JP19990338389 |
申请日期 |
1999.11.29 |
申请人 |
TOYOTA CENTRAL RES & DEV LAB INC;DENSO CORP |
发明人 |
OKAMOTO ATSUHITO;SUGIYAMA NAOHIRO;TANI TOSHIHIKO;KAMIYA NOBUO;KONDO HIROYUKI |
分类号 |
C30B29/36;C30B31/02;(IPC1-7):C30B29/36 |
主分类号 |
C30B29/36 |
代理机构 |
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主权项 |
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