发明名称 |
Carbon layer forming method |
摘要 |
The method of forming a carbon layer by vapor phase deposition starts a film deposition process of the carbon layer after a surface to be coated with the carbon layer is heated while adjusting a partial pressure of moisture in a film deposition system of the carbon layer to 5x10-6 Torr or less. This carbon layer forming method by means of a vapor phase deposition technique such as sputtering ensures that a high-quality carbon layer having high adhesion to the lower layer and significantly reduced pinholes or cracks is obtained.
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申请公布号 |
US6316054(B1) |
申请公布日期 |
2001.11.13 |
申请号 |
US20000534568 |
申请日期 |
2000.03.27 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
KASHIWAYA MAKOTO;NAKADA JUNJI |
分类号 |
B41J2/335;C23C14/06;C23C14/54;C23C16/26;(IPC1-7):C23C16/00 |
主分类号 |
B41J2/335 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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