发明名称 Active matrix assembly with light blocking layer over channel region
摘要 Improved thin film transistors resistant to photo-induced current and having improved electrical contact between electrodes and the source or drain regions are provided. The thin film transistors formed in accordance with the invention are particularly well suited for use in an active matrix substrate for a liquid crystal display panel. The liquid crystal display panels include an additional insulating layer formed between crossing orthogonal source lines and gate lines to provide a higher breakdown voltage between the source lines and gate lines than at the gate insulating layer of the thin film transistors.
申请公布号 US6316790(B1) 申请公布日期 2001.11.13
申请号 US19970859494 申请日期 1997.05.20
申请人 SEIKO EPSON CORPORATION 发明人 KODAIRA TOSHIMOTO;OSHIMA HIROYUKI;MANO TOSHIHIKO
分类号 G02F1/1335;G02F1/1362;G02F1/1368;H01L23/532;H01L23/538;H01L29/417;H01L29/45;H01L29/786;(IPC1-7):H01L29/41 主分类号 G02F1/1335
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