| 摘要 |
PURPOSE: An FED cleaning method using a laser and an HCl annealing is provided to be capable of simplifying cleaning equipment, reducing cleaning costs and shortening cleaning time by making metal contaminants into metal organics through an annealing process under the diluted mixing gas atmosphere in which cleaning gas and inert gas are mixed and then removing the metal organics, and cleaning the FED using a laser and nitrogen gas. CONSTITUTION: First, an FED is automatically conveyed to a cleaning space. Then, metal contaminants are made into metal organics by an annealing the FED under the diluted mixing gas atmosphere in which cleaning gas and inert gas are mixed, thereby removing the metal organics. Next, contaminants absorbed to the FED are separated by radiating a laser. Finally, the FED is completely cleaned by injecting inert gas to the separated contaminants and then discharging the inert gas including the contaminants.
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