ACID-RESISTANT MASKING COATING COMPOSITION

摘要

PROBLEM TO BE SOLVED: To obtain an acid-resistant masking coating composition suitable for production on an industrial scale without especially requiring a drying step. SOLUTION: This acid-resistant masking coating composition comprises a photo-setting resin containing (a) 10-90 pts.wt. of a photopolymerizable prepolymer, (b) 90-10 pts.wt. of a photopolymeriazble monomer and (c) a photoinitiator in an amount of 0.01-10 pts.wt. based on 100 pts.wt. of the sum total of the components (a) and (b) and at least one kind of an epoxy resin and an acrylic epoxy resin. The amount of at least the one kind of the epoxy resin and the acrylic epoxy resin compounded in the acid-resistant masking composition is 0.03-30 pts.wt. based on 100 pts.wt. of the photo-setting resin.