发明名称 Method to prevent the formation of a thinner portion of insulating layer at the junction between the side walls and the bottom insulator
摘要 A method to prevent the formation of a thinner portion of insulating layer, especially a gate oxide layer, at the junction between the side walls and the bottom insulator is disclosed. First, a pad oxide layer is formed on the side walls and the bottom of the trench. Next, a bottom oxide is formed on the lower portion of the trench. Then, the upper portion of the bottom oxide and the exposed pad oxide layer are removed by wet etching to leave a bottom oxide having a concave surface. Next, the conformal gate oxide layer is grown on the exposed side walls of the trench.
申请公布号 US6355974(B1) 申请公布日期 2002.03.12
申请号 US20000588110 申请日期 2000.05.31
申请人 MOSEL VITELIC, INC. 发明人 LIN PING-WEI;KAO MING-KUAN;LI JUI-PING
分类号 H01L21/28;H01L21/762;H01L21/8234;H01L29/423;H01L29/51;(IPC1-7):H01L29/04 主分类号 H01L21/28
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