发明名称 DRYING METHOD AND DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method and device of completely drying an object to be dried such as a shipping box and the like used for storing a semiconductor wafer having a complicated structure and transporting it for a short time. SOLUTION: An object to be dried is allowed to rotate during revolution in a method of allowing the object to be dried to revolve and drying it by a centrifugal force.
申请公布号 JP2002130942(A) 申请公布日期 2002.05.09
申请号 JP20000331032 申请日期 2000.10.30
申请人 SHIN ETSU HANDOTAI CO LTD 发明人 MATSUO TAKASHI;TOYAMA KOHEI
分类号 F26B5/08;F26B9/00;F26B11/08;H01L21/304;(IPC1-7):F26B5/08 主分类号 F26B5/08
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