发明名称 |
DRYING METHOD AND DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method and device of completely drying an object to be dried such as a shipping box and the like used for storing a semiconductor wafer having a complicated structure and transporting it for a short time. SOLUTION: An object to be dried is allowed to rotate during revolution in a method of allowing the object to be dried to revolve and drying it by a centrifugal force.
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申请公布号 |
JP2002130942(A) |
申请公布日期 |
2002.05.09 |
申请号 |
JP20000331032 |
申请日期 |
2000.10.30 |
申请人 |
SHIN ETSU HANDOTAI CO LTD |
发明人 |
MATSUO TAKASHI;TOYAMA KOHEI |
分类号 |
F26B5/08;F26B9/00;F26B11/08;H01L21/304;(IPC1-7):F26B5/08 |
主分类号 |
F26B5/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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