| 摘要 |
The invention relates to a process for coating in a vacuum chamber a substrate at least in part with a diamond-like nanocomposite composition, comprising the steps of a) plasma etching of the substrate by bombardment of the substrate by ions of an inert gas such as Ar, b) introducing in the vacuum chamber, at a working pressure of between 5.10<-3> and 5.10<-2> mbar, a liquid organic precursor containing the elements C, H, Si, O to be deposited in suitable proportions, which proportions remain substantially constant during the deposition process, c) forming a plasma from the introduced precursor by an electron assisted DC-discharge using a filament with a filament current of 50-150 A, a negative filament bias DC voltage of 50-300 V and with a plasma current between 0.1 and 20 A, d) depositing the composition on the substrate, to which a negative DC-bias or negative RF self-bias voltage of 200 to 1200 V is applied, in order to attract ions formed in the plasma; the frequency of the RF voltage being comprised between 30 and 1000 kHz. |
