发明名称 QUARTZ GLASS AND METHOD OF MANUFACTURING IT
摘要 PROBLEM TO BE SOLVED: To provide quartz glass and a method of manufacturing it having excellent corrosion resistance to plasma, especially for F-base plasma gas, used for jig materials for plasma reaction in manufacture of semiconductor devices. SOLUTION: The quartz glass contains metal elements and is improved in plasma corrosion resistance and has the concentration of metal elements of 0.1-20 wt.%, OH concentration of 100-2000 ppm, a content of foams and foreign substances of <100 mm2 projected area per 100 cm3, and the inner visible light transmissivity of 50%/cm or more.
申请公布号 JP2002220252(A) 申请公布日期 2002.08.09
申请号 JP20010008084 申请日期 2001.01.16
申请人 SHINETSU QUARTZ PROD CO LTD 发明人 SATO TATSUHIRO;YOSHIDA YOSHIMASA;FUJINOKI AKIRA
分类号 C03B20/00;C03C3/06;H01L21/302;H01L21/3065;(IPC1-7):C03C3/06;H01L21/306 主分类号 C03B20/00
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