发明名称 |
Opto-coupling device structure and method therefor |
摘要 |
A manufacturing technique for making grating features utilizes the etching characteristics for photoresist to provide desirable geometric shapes in close proximity to each other. This results in a grating for optocoupling, which is manufacturable and provides efficient coupling. A silicon waveguide is conveniently achieved using a SOI substrate so that the insulator underlying the silicon provides one material adjoining the silicon with a lower index of refraction than silicon. The top surface of the silicon has the desirable geometric shapes that result also in a lower index of refraction than silicon above the main body of the silicon substrate.
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申请公布号 |
US2002164122(A1) |
申请公布日期 |
2002.11.07 |
申请号 |
US20010846087 |
申请日期 |
2001.05.02 |
申请人 |
TAYLOR WILLIAM J.;WU WEI E.;CSUTAK SEBASTIAN M. |
发明人 |
TAYLOR WILLIAM J.;WU WEI E.;CSUTAK SEBASTIAN M. |
分类号 |
G02B5/18;H01L27/14;H01L27/146;H01L31/10;(IPC1-7):G02B6/34 |
主分类号 |
G02B5/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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