发明名称 ELECTROLESS PLATING METHOD FOR FINE PARTICLE
摘要 PROBLEM TO BE SOLVED: To obtain an uniform electroless plating film which has a desired film thickness under the accurate control while preventing the self-decomposition of a plating bath. SOLUTION: Fine particles subjected to Pd activation treatment are charged to the electroless plating bath in which the concentration of metallic ions is 0.1 to 1.5 g/L so that the surface area thereof is controlled to the ratio of 15 to 250 dm<2> /L to the plating bath, and the electroless plating is performed till the plating reaction is stopped without supplying a plating solution.
申请公布号 JP2002339077(A) 申请公布日期 2002.11.27
申请号 JP20010145833 申请日期 2001.05.16
申请人 C UYEMURA & CO LTD 发明人 HARITANI KOJI;HARADA TAKASHI;NISHIMOTO KAZUYOSHI
分类号 C23C18/16;C23C18/28;(IPC1-7):C23C18/16 主分类号 C23C18/16
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