发明名称 |
ELECTROLESS PLATING METHOD FOR FINE PARTICLE |
摘要 |
PROBLEM TO BE SOLVED: To obtain an uniform electroless plating film which has a desired film thickness under the accurate control while preventing the self-decomposition of a plating bath. SOLUTION: Fine particles subjected to Pd activation treatment are charged to the electroless plating bath in which the concentration of metallic ions is 0.1 to 1.5 g/L so that the surface area thereof is controlled to the ratio of 15 to 250 dm<2> /L to the plating bath, and the electroless plating is performed till the plating reaction is stopped without supplying a plating solution.
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申请公布号 |
JP2002339077(A) |
申请公布日期 |
2002.11.27 |
申请号 |
JP20010145833 |
申请日期 |
2001.05.16 |
申请人 |
C UYEMURA & CO LTD |
发明人 |
HARITANI KOJI;HARADA TAKASHI;NISHIMOTO KAZUYOSHI |
分类号 |
C23C18/16;C23C18/28;(IPC1-7):C23C18/16 |
主分类号 |
C23C18/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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