LITHOGRAPHIC APPARATUS, METHOD FOR FABRICATING DEVICE, AND DEVICE FABRICATED THEREBY

摘要

PURPOSE: A lithographic apparatus is provided to predict the momentary substrate table position error and feed it into a mask table control loop, adding it to a mask table set point and as a force to the mask table. CONSTITUTION: A radioactive rays system supplies a projection beam of radioactive rays. A support structure supports a patterning unit functioning to pattern the projection beam. A substrate table holds a substrate. A projection system projects the projection beam patterned by a floating target of the substrate. The first driving unit transfers the support structure in a given reference direction substantially parallel with the plane of the patterning unit. The second driving unit transfers the substrate table in a direction parallel with the reference direction to synchronize with the motion of the support structure. The first measuring unit determines a momentary position of the patterning unit regarding a fixed reference point. The second measuring unit determines a momentary position of the substrate table regarding a fixed reference point. A position error signal generating unit compares a predetermined momentary position of the substrate table with the measured momentary position of the substrate table and generates a position error signal according to a difference between the positions. A prediction unit generates a future position error signal based on at least one position error signal and transfers the future position error signal to a correction unit functioning to control the momentary position of the patterning unit and compensate for the difference.