| 摘要 |
PROBLEM TO BE SOLVED: To provide a magnetron sputtering apparatus suitable for forming a film consisting of a magnetic material on a substrate. SOLUTION: The magnetron sputtering apparatus having a target to be sputtered, a substrate arranged so as to face the target, on which the sputtered material from the target is deposited, and a magnetic field generating means for generating the magnetic field on the surface of the target, comprises the target composed of magnetic materials, arranging the magnetic field generating means so as to surround the target, and forming an unbalanced magnetic field.
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