发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SAME
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device capable of preventing the entry of moisture into a chip and also attaining a getter effect. SOLUTION: In the semiconductor device in which after a transistor Tr or the like is formed on a device forming region of a silicon substrate 1, a scrive region is divided for each chip, O3 -BPSG film 10 formed on a device forming region within the chip is configured to be covered with a moisture preventative film 11 or an inter-layer insulation film 12 to prevent it from being exposed from a chip end.
申请公布号 JP2003017557(A) 申请公布日期 2003.01.17
申请号 JP20010203662 申请日期 2001.07.04
申请人 DENSO CORP 发明人 TANAKA YASUSHI;OGINO MASAHIRO
分类号 H01L21/768;H01L23/522;(IPC1-7):H01L21/768 主分类号 H01L21/768
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