发明名称 |
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor device capable of preventing the entry of moisture into a chip and also attaining a getter effect. SOLUTION: In the semiconductor device in which after a transistor Tr or the like is formed on a device forming region of a silicon substrate 1, a scrive region is divided for each chip, O3 -BPSG film 10 formed on a device forming region within the chip is configured to be covered with a moisture preventative film 11 or an inter-layer insulation film 12 to prevent it from being exposed from a chip end.
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申请公布号 |
JP2003017557(A) |
申请公布日期 |
2003.01.17 |
申请号 |
JP20010203662 |
申请日期 |
2001.07.04 |
申请人 |
DENSO CORP |
发明人 |
TANAKA YASUSHI;OGINO MASAHIRO |
分类号 |
H01L21/768;H01L23/522;(IPC1-7):H01L21/768 |
主分类号 |
H01L21/768 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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