发明名称 |
COMPOUND SEMICONDUCTOR EPITAXIAL WAFER |
摘要 |
PROBLEM TO BE SOLVED: To provide a compound semiconductor epitaxial wafer on which an element having good electrical characteristics can be fabricated by reducing leak current between the source-drain electrodes. SOLUTION: The compound semiconductor epitaxial wafer comprises a semiconductor substrate 10, and an epitaxial layer 20 formed on the semiconductor substrate 10 wherein a single layer or multilayer insulation layer 15 is provided between the semiconductor substrate 10 and the epitaxial layer 20.
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申请公布号 |
JP2003031794(A) |
申请公布日期 |
2003.01.31 |
申请号 |
JP20010213764 |
申请日期 |
2001.07.13 |
申请人 |
HITACHI CABLE LTD |
发明人 |
ISONO RYOTA;WADA JIRO;TAKEUCHI TAKASHI |
分类号 |
H01L29/205;H01L21/205;H01L21/338;H01L29/812;(IPC1-7):H01L29/205 |
主分类号 |
H01L29/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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