发明名称 COMPOUND SEMICONDUCTOR EPITAXIAL WAFER
摘要 PROBLEM TO BE SOLVED: To provide a compound semiconductor epitaxial wafer on which an element having good electrical characteristics can be fabricated by reducing leak current between the source-drain electrodes. SOLUTION: The compound semiconductor epitaxial wafer comprises a semiconductor substrate 10, and an epitaxial layer 20 formed on the semiconductor substrate 10 wherein a single layer or multilayer insulation layer 15 is provided between the semiconductor substrate 10 and the epitaxial layer 20.
申请公布号 JP2003031794(A) 申请公布日期 2003.01.31
申请号 JP20010213764 申请日期 2001.07.13
申请人 HITACHI CABLE LTD 发明人 ISONO RYOTA;WADA JIRO;TAKEUCHI TAKASHI
分类号 H01L29/205;H01L21/205;H01L21/338;H01L29/812;(IPC1-7):H01L29/205 主分类号 H01L29/205
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