发明名称 Image exposing method and image exposing apparatus
摘要 The image exposing method and apparatus expose a light-sensitive material with the light emitted from a light source matching the spectral sensitivity of the material and modulated with a two-dimensional spatial modulator. The light-sensitive material and the modulator are relatively scanned in the direction of one pixel column in the modulator, as well as, in synchronism with this scanning, the image created by the modulator is also scanned in the scanning direction so as to perform multiple exposures of the material and exposure with part of the pixels in at least one of the pixel columns is rested always irrespective of the image to be recorded such that a maximum quantity of exposure with each of the pixel columns in the scanning direction in equal in each pixel column.
申请公布号 US6552777(B2) 申请公布日期 2003.04.22
申请号 US20010805468 申请日期 2001.03.14
申请人 FUJI PHOTO FILM CO., LTD. 发明人 SUNAGAWA HIROSHI
分类号 B41J2/445;B41C1/10;B41J2/465;G02B26/08;G03F7/20;G03F7/24;G06K15/12;H04N5/74;(IPC1-7):G03B27/54;G03B27/32;G03B27/58 主分类号 B41J2/445
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